Automatic Mask Inspection System EM-6029B

The system is designed for automatic detection of pattern defects on 10:1 and 5:1 projection lithography reticles used in IC, semiconductors manufacture.

For photomask inspection die-to-database comparison method is used.
The die-to-database comparison method makes the EM-6029B system universal for automatic detection of photomask pattern defects of all types.

Detection Threshold

Minimum sizes of detectable defects are: 0.7 µm x 0.7 µm and 0.5 µm x 1.0 µm at 0.95 detection probability. When working with any detection threshold (0.5 mm, 1.0 mm, 2.0 mm ) the mode of program filtering can be switched on.

Inspection Modes

• High magnification mode with 0.5 µm detection threshold.
• Medium magnification mode with 1.0 µm detection threshold.
• Low magnification mode with 2.0 µm detection threshold.

Low magnification mode is set by changing the objective lens.

Throughput

In high magnification mode - 2.5 mm²/s (1 hr 10 min over 100 mm x 100 mm field)

In medium magnification mode - 5.0 mm²/s (35 min over 100 mm x 100 mm field)

In low magnification mode - 15.0 mm²/s (12 min over 100 mm x 100 mm field)

Reticle Sizes:

• 3" x 3" (76 mm x 76 mm)
• 4" x 4" (102 mm x 102 mm)
• 5" x 5" (127 mm x 127 mm)
• 6" x 6" (153 mm x 153 mm)
• 7" x 7" (178 mm x 178 mm)

Working field size is 153 mm x 153 mm

Reticle Plating Types

Chrome, chrome + oxide, molybdenum, iron oxide. Pellicle-protected reticles can also be inspected. A pellicle frame up to 8 mm high from top or bottom surfaces is acceptable.

Other Features

1. Defects monitoring mode whereby the operator can observe the defects on the graphics display screen or in the microscope (by transmitted and reflected light).
2. Mismatch masking at feature edges within ±1 and ±2 pixels.
3. Filtering of defects of specified size.
4. The system automatically classifies reticle layout defects according to SEMI standards.

Compatibility

1. Database data can be stored on a floppy disk, on a streamer tape or a magnetic tape. Both the streamer and magnetic tape drives are optional.
2. Data compatibility with the specified type of the pattern generator can be provided as an option.
3. Data compatibility with the specified type of the reticle repair station can be provided as an option.
4. System's delivery set can include an automatic reticle loader which is compatible, via a mechanical interface, with ASYST containers.

The system is designed for operation in clean room : Class 100 ( 9m²) for machine unit; Class 10 000 (10 m² ) for control unit. Power requirements: 220 V, 50 Hz.