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Wafer Stepper EM-5084B
EM-5084 B is intended for alignment and die-to-die projection exposure of semiconductor wafers in LSI and VLSI production.
The principle of operation consists in sequential transfer (step-and-repeat) of the reduced in size reticle image onto a prefocused, aligned with the reticle image plane semiconductor wafer, oriented by alignment marks applied to its working surface.
ÑONFIGURATION EM-5084B consists of the following units:
Control unit
X,Y stage with a three-coordinate laser measuring
system based on interferometers
Focusing and leveling system
Image analysis system (IAS)
Reticle-to-wafer photoelectric alignment system
Projection system, including 5x projection
lens, illumination unit and light energy dose system
Wafer loading unit
Reticle loading unit
The alignment can be carried out in two ways :
- global alignment by 2, 4, 9, 16 and 25 marks;
- die-to-die alignment.
The machine is equipped with an automatic system of
reticle loading onto the working position from special
dust-proof containers of “Entegris” company.
Specifications
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| Operating wavelength |
404 nm |
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| Reduction ratio |
1:5 |
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| Maximum working field |
16 x 16 mm |
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| Minimum feature size |
0.8 µm |
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| Alignment accuracy |
± 0.1 µm |
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| Wafer diameter |
150 mm, 200mm |
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| Reticle size |
127 x 127 mm |
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| Reticle library capacity |
12 ps. |
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| Throughput (wafer diameter 150 mm) |
45 wafers/hour |
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| Weight |
2900 kg |
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Operating Conditions
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| Clean room: |
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| Machine unit |
Class 10 |
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| Control system |
Class 10 000 |
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| Power requirements |
220 V, 50 Hz |
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| Power consumption |
3,5 kW |
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| Footprint |
13 m2 (5 m2 in Class 10 clean room, 8 m2 in Class 10 000 clean room) |
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