Laser Pattern Generator EM-5189

The generator is designed to generate patterns on metallized photomasks in the production of LSIs, VLSIs and other electronics devices.

The patterning is based on a raster scanning technique.
The exposure system uses a continuous ultraviolet argon (crypton) ion laser at wavelength of 350.7nm.
Laser output power 300mW. Model SP-2060 (SP-2060/65) by Spectra-Physics.

Writing Quality

Single pass mode Double pass mode Throughput (100x100mm2 area) 30 min 60 min Exposure area 215x215 mm2 215x215 mm2 Overlay accuracy 50 nm 50 nm 2nd layer overlay accuracy 100 nm 100 nm Minimum feature size 0.6 µm 0.6 µm Edge roughness 60 nm 40 nm CD accuracy 60 nm 40 nm CD repeatability 60 nm 40 nm