Multichannel Laser Pattern Generator EM-5189-01
The generator is intended for exposure of metallized reticles. The time required to generate reticle layer does not depend on the complexity of its description. The generator is equipped with alignment system which enables exposure in the double masking mode.
Brief Description The generator uses the principle of sweeping of laser beam using an electrooptic device.
The generator is composed of the following:
- 351-nm continuous-wave ionized Ar laser;
- 16-channel diffraction electrooptic shutter with control system which changes exposure dose in the light channel;
- 4-stage discrete coordinate electrooptic deflector with a polarization selector;
- phase diffraction grating which create 17 orders of equal intensity;
- system to check paramerts of light spots;
- projection lens with reduction ratio 100:1 and numerical aperture 0.4;
- focus sensor based on CCD-detector with read-out and focus plane position specification increment 0.03 mm;
- system for automatic loading of reticles to the working area;
- XY-system to move wafers based on X, Y interferometers;
- alignment system working with the marks of any shape;
- preparation and heat setting system for the air supplied to the working area;
- vast range of test and diagnostic programs.
The generator is controlled by IBM PC.
Specifications
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| Placement accuracy |
100 nm |
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| Minimum feature size |
800 nm |
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| Address grid |
10 nm |
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| Edge roughness |
40 nm |
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| Overlay Accuracy |
75 nm |
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| CD Repeatability |
40 nm |
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| CD Accuracy |
40 nm |
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| Throughput (100 x 100 mm area ) |
1hr |
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| Exposure area size |
153 x 153 mm |
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Service Conditions The generator is designed for operation in clean room. Opto-mechanical unit - Class 100. Control system - Class 10000.
Power supply of the generator is provided from AC power line 220/380 V, 50 Hz; power consumption up to 29 (44) kW; footprint 22 m2 (10 m2 in clean room Class 100, 12 m2 in clean room Class 10 000). Weight 2400 kg.
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