Laser Pattern Generator EM-5109

The laser pattern generator is designed for fabrication of metallized reticles (masks) in production of ICs, semiconductor devices of various applications, photoelectronic transducers, LCDs, precision PCBs, MEMS, microware circuits, special measuring and test masks for both production and applications.

The pattern generator is an automatic system which forms circuit pattern by positioning rectangular images on photo resist plates according to information received from CAD system via a network channel or via a magnetic carrier. The generator works in two modes: positioner, i.e. stop-by-stop exposures, and "on fly" exposure. The machine unit uses vibration damping and thermostable materials (habra diabase, glass ceramic). The machine unit consists of XY-stage, aperture mechanism, focusing system, projection lens and laser beam system. The XY - stage carriage with reticle plate is driven by linear step motors and controlled by laser interferometers. The beam forming system uses a monoblock pulse laser with wavelength 337 nm, 8-ns light pulse and 1-kHz working frequency. The control system is based on a host Intel Pentium II PC and two high-speed single-board industrial computers with VMEbus.

Specifications

Throughput (for regular patterns) up to 1.7 million exposures/hr Working field 300 x 300 mm XY-stage positional precision ± 0.25 µm XY-stage resolution 0.125 µm Aperture size range 1-300 µm Aperture resolution 0.1 µm Aperture rotation 0-90º Reticle sizes according to SEMI Standard Power requirements 220 V, 50 Hr, 2.3 kW Weight 2000 kg