Photorepeater EM-5062M
The photorepeater is intended for manufacture of metallized master and production photomasks in LSI, VLSI production.
Brief Description The system operates in automatic mode and is remotely controlled by the operator. Its operation is based on die-by-die transfer (multiplication) of reduced reticle image onto the photomask blank plate.
The system operates in the following automatic modes:
- loading a plate from the sending cassette to the XY-stage inductor table;
- fixing the plate on the working table;
- reticle image multiplication onto the plate with automatic focusing on each die;
- unloading the exposed plate to the receiving cassette.
Specifications
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| Throughput at 0.5 s exposure time and 10 x 10 mm multiplication step on 127 x 127 mm plates ( 61 dice ) |
> 30 photomasks/hr |
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| XY-stage working travel |
150 mm x 150 mm |
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| XY-stage positioning error |
< ±0.4 µm |
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| XY-stage positioning repeatability |
> 0.2 µm |
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| Reduction ratio |
10:1 |
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| Max. die size on photomask |
10 mm x 10 mm |
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| Photographic resolution limit ( min. feature - line / space ) of the projection system on 10 x 10 mm die field |
1 µm |
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| Nonreproducibility of 1.2 µm feature (line/space ) |
< 0.2 µm |
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| Photomask blank plate size: |
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4” x 4” (102 mm x 102 mm) |
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5” x 5” (127 mm x 127 mm) |
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6” x 6” (153 mm x 153 mm) |
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| Reticle size : |
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5” x 5” (127 mm x 127 mm) |
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6” x 6” (153 mm x 153 mm) |
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| Weight |
1800 kg |
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Operating Conditions The photorepeater is designed for operation in clean room. Machine unit - Class 100. Control system - Class 10000.
Power supply of the photorepeater is provided from AC power line 220/380 V, 50 Hz; power consumption up to 3 kW; footprint 17 m2 ( 10 m2 in clean room Class 100, 7 m2 in clean room Class 10 000 ).
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