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Laser Pattern Generator EM-5009BM
The laser pattern generator is designed for fabrication of metallized reticles (masks) in production of ICs, semiconductor devices of various applications, photoelectronic transducers, LCDs, precision PCBs, MEMS, microwave circuits, special measuring and test masks for both production and research applications.
The pattern generator is an automatic system that form circuit patterns by positioning rectangular images (principle of microphotocomposition) according to the information from CAD-system through a network communication channel or on a floppy disk.
Main features:
- High throughput (“flash-on-fly”) due to the use of a high-speed molecular nitrogen pulse laser, λ=337 nm;
- Small footprint due to the built-in laser with power supply;
- Simple construction and easy maintenance;
- Use of linear step motors with feedback in the X-Y stage and aperture mechanisms;
- Highly effective vibration-proof system;
- The control system uses high-speed single-board industrial computers and IBM PC.
Specifications
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| Throughput (for regular structures) |
up to 1.5 million exposures/hr |
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| Stage travel area |
150x150 mm |
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| Stage positioning accuracy |
± 0.25 µm |
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| Stage resolution |
0.25 µm |
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| Aperture size range |
2 - 300 µm |
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| Aperture resolution |
0.5 µm |
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| Aperture rotation |
0 - 90º |
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| Power requirements |
200 V, 50 Hz, 2.5 kW |
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