Laser Pattern Generators

Scanning Laser Pattern Generator is designed for fabrication of masks (reticles) in production of LSI, VLSI; minimum feature size 600 nm

Laser Pattern Generator is designed for fabrication of masks (reticles) in production of semiconductor devices, LCDs, PCBs, etc.; minimum feature size 1 μm

Laser Pattern Generator is designed for fabrication of masks (reticles) in production of semiconductor devices, LCDs, PCBs, etc.; minimum feature size 2 μm

Photorepeater is designed for fabrication of metallized master and production photomasks in production of semiconductor devices