Planar began to develop equipment for production of masks for ICs in the early 1960s. In 1966 we started production manufacturing of our first pattern generator (Model EM-508) which used the method of photocomposition. This model initiated the development of a family of laser pattern generators with higher throughput, better reliability and accuracy as well as smaller features sizes. In 1984 the multibeam laser pattern generator (Model EM-5089) was developed. The range of equipment for mask fabrication was widening with the development of new kinds of equipment: mask repair system (Model EM-551) developed in 1974, mask coordinate/overlay inspection system (Model EM-6009) developed in 1983 and automatic defect inspection system (Model EM-6029) developed in 1990. Nowadays Planar Concern offers a complete set of equipment for the defect-free mask fabrication. It is possible to build complete lines for production of devices of different complexity: from VLSIs with submicron design rules to hybrid integrated circuits and semiconductor devices, printed circuit boards, TV masks and LCDs. The essential factor is the possibility of optimization of the cost of ownership depending on the complexity of manufactured devices.
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